AMT-equipment at TU Wien

We are focusing on developing materials and systems for lithography-based AMT processes. Currently we have the following systems installed in our labs.

Objet Eden 260

Build size (x - y - z)

260x260x200mm

Resolution

600dpi

Two-photon polymerization (2PP)

Technical specification

2PP structuring device based on 800nm femto-second Laser.

Build envelope 40x40x60mm.
Minimum resolution in xy-plane: 200nm
Minimum resolution in z-plane: 200nm

Manufacturer: Laserzentrum Hannover

Producing three-dimensional “nano” scale structures out of a photosensitive resin, having feature resolutions down to 200 nm is not science fiction any more. The Two Photon Process (TPA) even makes it possible to write inside a given volume. In contrast to other lithography-based SFF processes it is not necessary to build a part by stacking up individual layers. Using this new technique the benefits of real 3D-structuring can be used.

Two-photon polymerization (2PP) setup based on a Galvanoscanner

Technical specification

2PP structuring device based on 800nm femto-second Laser and a Galvanoscanner.

Build envelope 20x20x25mm.
Minimum resolution in xy-plane: 200nm
Minimum resolution in z-plane: 700nm

Manufacturer: TU-Wien, AMT

Digital Light Processing

Stereolithography machine based on DLP (Digital Light Processing). The build-envelope of the machine is 75x39x52mm. The minimal layer thickness is 0.025mm, the lateral resolution is 0.05mm.

Manufacturer:Envisiontec